Development of Light-Guide Plate Using UV-LIGA Process

DOI Web Site 2 Citations 7 References
  • 出井 一義
    中西金属工業（株）新規事業室
  • 糸魚川 貢一
    （株）東海理化技術開発センター開発部マイクロシステム開発室
  • 北谷 武
    佐和鍍金（株）
  • 佐和 吉敬
    佐和鍍金（株）
  • 山下 健治
    兵庫県立大学高度産業科学技術研究所ナノマイクロシステム研究室
  • 野田 大二
    兵庫県立大学高度産業科学技術研究所ナノマイクロシステム研究室
  • 服部 正
    兵庫県立大学高度産業科学技術研究所ナノマイクロシステム研究室

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Other Title
  • UV-LIGAプロセスによる導光板の開発
  • UV LIGA プロセス ニ ヨル ドウコウバン ノ カイハツ

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Abstract

Demands for personal digital assistants (PDA) require them to be of low profile, lightweight, and to have low power consumption. To fulfill these demands, it is necessary to develop a backlight unit that has features of low power consumption, high brightness, and high efficiency. The light source in a backlight unit has a light-guide plate with microreflection dots, which is a very important component. The smaller the microreflection dots and the higher the aspect ratio, the brighter the screen. The result of a simulation revealed that it is possible to improve the brightness of the light-guide plate by forming the shape of a truncated cone with a taper angle range of 68 to 78 degrees. However, by using the existing machining technology, it is difficult to form the microreflection dots into such a shape. Thus, we developed an innovative UV diffraction exposure method to fabricate tapered microstructure. We fabricated a light-guide plate using the UV-LIGA process by the UV diffraction exposure.

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