Deposition Process of Aluminum Thin Films by Intense Pulsed Light Ion-Beam Evaporation

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著者

    • SHISHIDO Hiroaki
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • YANAGI Hideki
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • KAWAHARA Hideki
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • SUZUKI Tsuneo
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • YUNOGAMI Takashi
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • SUEMATSU Hisayuki
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • JIANG Weihua
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology
    • YATSUI Kiyoshi
    • Extreme Energy-Density Research Institute, Nagaoka University of Technology

収録刊行物

  • 電気学会研究会資料. PST, プラズマ研究会

    電気学会研究会資料. PST, プラズマ研究会 2003(59), 45-50, 2003-10-21

参考文献:  12件中 1-12件 を表示

各種コード

  • NII論文ID(NAID)
    10018980121
  • NII書誌ID(NCID)
    AA11501025
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • データ提供元
    CJP書誌 
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