Deposition Process of Aluminum Thin Films by Intense Pulsed Light Ion-Beam Evaporation

• SHISHIDO Hiroaki

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• YANAGI Hideki

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• KAWAHARA Hideki

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• SUZUKI Tsuneo

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• YUNOGAMI Takashi

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• SUEMATSU Hisayuki

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• JIANG Weihua

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

• YATSUI Kiyoshi

  Extreme Energy-Density Research Institute, Nagaoka University of Technology

Journal

• 電気学会研究会資料. PST, プラズマ研究会

  電気学会研究会資料. PST, プラズマ研究会 2003 (59), 45-50, 2003-10-21

Keywords

• intense pulsed light ion-beam
• ablation plasma
• Al thin film
• surface roughness
• droplet
• intense pulsed ion-beam evaporation

Details

• CRID: 1573668925182905216
• NII Article ID: 10018980121
• NII Book ID: AA11501025
• Text Lang: en
• Data Source:
  • CiNii Articles