Semiconductor Processes and Plasma Surface Reactions

• TSUDA Ken-ichiro

  NEC

• KAZUMI Hideyuki

  Hitachi

• NAKANO Toshiki

  National Defense Academy

Bibliographic Information

Other Title

• 半導体プロセスとプラズマ表面反応

Journal

• 電気学会研究会資料. ED, 放電研究会

  電気学会研究会資料. ED, 放電研究会 2001 (121), 47-52, 2001-09-12

Keywords

• plasma etching
• electron collision cross sections
• surface reactions
• chlorine plasmas
• fluorocarbon plasmas

Details

• CRID: 1571980075322810368
• NII Article ID: 10018988307
• NII Book ID: AN10320559
• Text Lang: ja
• Data Source:
  • CiNii Articles