Application of EB direct writing lithography on manufacturing advanced LSI devices

• TAMURA Takao

  NEC Electronics Corp.

• TADA Munehiro

  NEC Corp.

• FUJII Kiyoshi

  NEC Electronics Corp.

• HAYASHI Yoshihiro

  NEC Corp.

Bibliographic Information

Other Title

• EB直描を用いた先端デバイスの試作

Journal

• 電気学会研究会資料. LAV, 光応用・視覚研究会

  電気学会研究会資料. LAV, 光応用・視覚研究会 2003 (1), 1-5, 2003-11-28

Keywords

• electron beam
• EB
• direct writing
• cell projection
• CD accuracy
• proximity effect
• Cu damascene interconnect

Details

• CRID: 1573950400159362816
• NII Article ID: 10018988830
• NII Book ID: AN00346658
• Text Lang: ja
• Data Source:
  • CiNii Articles