Preparation of Fine Resist Patterns by using Supercritical Drying Method

• KIKUCHI Yukiko

  ASET Association of Super-Advanced Electronics Technologies

Bibliographic Information

Other Title

• 超臨界乾燥を用いた微細レジストパターン形成

Journal

• 電気学会研究会資料. LAV, 光応用・視覚研究会

  電気学会研究会資料. LAV, 光応用・視覚研究会 2003 (1), 19-23, 2003-11-28

Keywords

• Supercritical drying
• resist pattern
• pattern collapse
• X-ray lithography

Details

• CRID: 1571980075322387456
• NII Article ID: 10018988854
• NII Book ID: AN00346658
• Text Lang: ja
• Data Source:
  • CiNii Articles