Ultra Low Cout×Ron Photo-relay using Depleted Drift Layer in Thin Film SOI
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- KAWAMURA Keiko
- Toshiba Corporation
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- KITAGAWA Mitsuhiko
- Toshiba Corporation
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- FURUKAWA Kazuyoshi
- Toshiba Corporation
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- KURAMOCHI Nobuichi
- Toshiba Corporation
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- NAKAGAWA Akio
- Toshiba Corporation
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- AIZAWA Yoshiaki
- Toshiba Corporation
Bibliographic Information
- Other Title
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- 薄膜(0.1μm)SOI構造フォトリレー用超低 Cout × Ron MOSFET
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Journal
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- 電気学会研究会資料. EDD, 電子デバイス研究会
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電気学会研究会資料. EDD, 電子デバイス研究会 2003 (44), 5-9, 2003-09-18
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Keywords
Details
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- CRID
- 1572543025276262144
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- NII Article ID
- 10018989829
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- NII Book ID
- AN1044178X
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- Text Lang
- ja
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- Data Source
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- CiNii Articles