酸素リモートプラズマを用いたZnOのMOCVD成長  [in Japanese] MOCVD growth of ZnO thin films using Oxygen remote plasma  [in Japanese]

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Author(s)

Journal

  • 電気学会研究会資料. EDD, 電子デバイス研究会  

    電気学会研究会資料. EDD, 電子デバイス研究会 2003(14), 61-64, 2003-01-28 

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Codes

  • NII Article ID (NAID)
    10018990124
  • NII NACSIS-CAT ID (NCID)
    AN1044178X
  • Text Lang
    JPN
  • Article Type
    ART
  • Data Source
    CJP 
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