MgO高速成膜用誘導放電支援反応性スパッタリング法の開発  [in Japanese] Development of Reactive Sputtering Method Assisted by Inductively Coupled Discharge for High-Rate Deposition of Magnesium Oxide  [in Japanese]

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Author(s)

    • 松田 良信 MATSUDA Yoshinobu
    • 長崎大学工学部電気電子工学科 Department of Electrical and Electronic Engineering, Faculty of Engineering, Nagasaki University
    • 田代 佳 TASHIRO Kei
    • 長崎大学工学部電気電子工学科 Department of Electrical and Electronic Engineering, Faculty of Engineering, Nagasaki University
    • 小山 悠 KOYAMA Yu
    • 長崎大学工学部電気電子工学科 Department of Electrical and Electronic Engineering, Faculty of Engineering, Nagasaki University
    • 藤山 寛 FUJIYAMA Hiroshi
    • 長崎大学工学部電気電子工学科 Department of Electrical and Electronic Engineering, Faculty of Engineering, Nagasaki University

Journal

  • 電気学会研究会資料. EDD, 電子デバイス研究会  

    電気学会研究会資料. EDD, 電子デバイス研究会 2002(19), 127-132, 2002-01-25 

References:  10

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Codes

  • NII Article ID (NAID)
    10018990717
  • NII NACSIS-CAT ID (NCID)
    AN1044178X
  • Text Lang
    JPN
  • Article Type
    ART
  • Data Source
    CJP 
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