Micro-scale Thermal Effusivity/Conductivity of Silicon Carbide Ceramics
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- Yamada Ikuko
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Kume Shoichi
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Watari Koji
- National Institute of Advanced Industrial Science and Technology (AIST)
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- Hatori Kimihito
- Hudson Lab., Bethel Co., Suginami, Ibaraki
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- Matusi Genzo
- Hudson Lab., Bethel Co., Suginami, Ibaraki
Bibliographic Information
- Other Title
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- 炭化ケイ素セラミックスの微小領域の熱浸透率/熱伝導率
- タンカ ケイソ セラミックス ノ ビショウ リョウイキ ノ ネツ シントウリツ ネツ デンドウリツ
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Abstract
Thermal properties of sintered SiC polycrystal and single crystal at micrometer-scale were quantitatively measured by using a thermal microscope with thermo-reflectance and periodic heating techniques. The average value of thermal effusivity of the polycrystal was almost equal to that measured by laser flash technique. While the thermal effusivity of the single crystal was homogeneous, that of the polycrystal was heterogeneous. The portions of very low thermal effusivity were found to correspond to pores present. The thermal effusivities from the region excepting the pore portions in the sintered SiC were in the range of 21.0 to 25.8 kJ·s-0.5m-2K-1and the variation of the thermal effusivity was estimated about 5 kJ·s-0.5m-2K-1.
Journal
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- Netsu Bussei
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Netsu Bussei 22 (3), 172-176, 2008
JAPAN SOCIETY OF THERMOPHYSICAL PROPERTIES
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Keywords
Details 詳細情報について
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- CRID
- 1390282679641651840
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- NII Article ID
- 10021064639
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- NII Book ID
- AN10064743
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- COI
- 1:CAS:528:DC%2BD1cXhtVGgtbfF
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- ISSN
- 1881414X
- 0913946X
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- NDL BIB ID
- 9628718
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed