Room temperature processable organic-inorganic hybrid photolithographic materials based on a methoxysilane cross-linker

• Ji Young Park

• Jin-Baek Kim

Bibliographic Information

Other Title

• Room temperature processable organic inorganic hybrid photolithographic materials based on a methoxysilane cross linker

Journal

• Polymer journal / Society of Polymer Science, Japan

  Polymer journal / Society of Polymer Science, Japan 40 (7), 663-666, 2008

  Tokyo : Springer Nature

Keywords

• Photolithography
• Bilayer resist
• Trimethoxysilane

Details

• CRID: 1523388079535243648
• NII Article ID: 10021118802
• NII Book ID: AA00777013
• ISSN: 00323896
• NDL BIB ID: 9566198
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9566198
• Text Lang: en
• NDL Source Classification:
  • ZP16(科学技術--化学・化学工業--高分子化学・高分子化学工業)
• Data Source:
  • NDL
  • CiNii Articles