パルス放電による水中の難分解性化学物質分解 Pulsed-discharge Purification of Water Containing Non-degradable Hazardous Substances

この論文にアクセスする

この論文をさがす

著者

    • 宮崎 泰至 MIYAZAKI Yasushi
    • 室蘭工業大学 工学部 電気電子工学科 Department of Electrical and Electronic Engineering, Muroran Institute of Technology
    • 佐藤 孝紀 SATOH Kohki
    • 室蘭工業大学 工学部 電気電子工学科 Department of Electrical and Electronic Engineering, Muroran Institute of Technology
    • 伊藤 秀範 ITOH Hidenori
    • 室蘭工業大学 工学部 電気電子工学科 Department of Electrical and Electronic Engineering, Muroran Institute of Technology

抄録

The decomposition characteristics of phenol in an aqueous solution by the exposure of a pulsed-discharge plasma are investigated for different electrode configuration, applied voltage, and the humidity and composition of a background gas. It is likely that OH radicals are responsible for the decomposition of phenol in the solution for all kind of background gases. In pure O<sub>2</sub>, the decomposition rate of phenol increases due to the generation of O and O<sub>3</sub>, and in pure N<sub>2</sub>, OH radicals, produced by N<sub>2</sub> excited in metastable state, contribute to the phenol decomposition. In N<sub>2</sub>-O<sub>2</sub>, the decomposition rate of phenol stays lower values, since NO<sub>x</sub>, produced by the pulsed plasma, reduces O<sub>3</sub> concentration and the production of the NO<sub>x</sub> inhibits O<sub>3</sub> production. In Ar-O<sub>2</sub>, the decomposition rate of phenol rises with an increase in the mixture ratio of Ar. It is likely that excited Ar atoms are responsible for the decomposition of phenol in the solution at higher mixture ratio of Ar. Further, no significant difference in the decomposition rate is found between the pulsed discharge and a DC corona discharge.

収録刊行物

  • 電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society  

    電気学会論文誌. A, 基礎・材料・共通部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A, A publication of Fundamentals and Materials Society 128(4), 172-178, 2008-04-01 

    The Institute of Electrical Engineers of Japan

参考文献:  15件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

被引用文献:  13件

被引用文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10021129542
  • NII書誌ID(NCID)
    AN10136312
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    03854205
  • NDL 記事登録ID
    9451705
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-793
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
ページトップへ