パルス放電による水中の難分解性化学物質分解 [in Japanese] Pulsed-discharge Purification of Water Containing Non-degradable Hazardous Substances [in Japanese]
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The decomposition characteristics of phenol in an aqueous solution by the exposure of a pulsed-discharge plasma are investigated for different electrode configuration, applied voltage, and the humidity and composition of a background gas. It is likely that OH radicals are responsible for the decomposition of phenol in the solution for all kind of background gases. In pure O<sub>2</sub>, the decomposition rate of phenol increases due to the generation of O and O<sub>3</sub>, and in pure N<sub>2</sub>, OH radicals, produced by N<sub>2</sub> excited in metastable state, contribute to the phenol decomposition. In N<sub>2</sub>-O<sub>2</sub>, the decomposition rate of phenol stays lower values, since NO<sub>x</sub>, produced by the pulsed plasma, reduces O<sub>3</sub> concentration and the production of the NO<sub>x</sub> inhibits O<sub>3</sub> production. In Ar-O<sub>2</sub>, the decomposition rate of phenol rises with an increase in the mixture ratio of Ar. It is likely that excited Ar atoms are responsible for the decomposition of phenol in the solution at higher mixture ratio of Ar. Further, no significant difference in the decomposition rate is found between the pulsed discharge and a DC corona discharge.
- IEEJ Transactions on Fundamentals and Materials
IEEJ Transactions on Fundamentals and Materials 128(4), 172-178, 2008-04-01
The Institute of Electrical Engineers of Japan