Development of MEMS Capacitive Sensor Using a MOSFET Structure

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The concept of a capacitive MOSFET sensor using a SOI wafer for detecting vertical force applied to its floating gate was already reported by the authors. A MOSFET is fabricated on a SOI wafer, and the box oxide under the gate is removed to release the gate structure. This sensor detects the displacement of the movable gate electrode from changes in drain current, and this current can be amplified electrically by adding voltage to the gate, i.e., the MOSFET itself serves as a mechanical sensor structure. Following this, the present paper reports the fabrication of a practical test device and its preliminary characterization. The present paper also proposes a circuitry, which converts the drain current change to the voltage change while compensating the temperature change. The performance of this circuitry is confirmed by SPICE simulation. In accelerometer application, a comparatively heavy proof mass and thin supporting beams are necessary for increasing the sensitivity. For this purpose, a fabrication process of depositing a thick mass structure using electroplating is newly proposed.

収録刊行物

  • 電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society  

    電気学会論文誌. E, センサ・マイクロマシン準部門誌 = The transactions of the Institute of Electrical Engineers of Japan. A publication of Sensors and Micromachines Society 128(3), 102-107, 2008-03-01 

    The Institute of Electrical Engineers of Japan

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各種コード

  • NII論文ID(NAID)
    10021135078
  • NII書誌ID(NCID)
    AN1052634X
  • 本文言語コード
    ENG
  • 資料種別
    ART
  • ISSN
    13418939
  • NDL 記事登録ID
    9400718
  • NDL 雑誌分類
    ZN31(科学技術--電気工学・電気機械工業)
  • NDL 請求記号
    Z16-B380
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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