Effect of CH/C_2 Species Density on Surface Morphology of Diamond Film Grown by Microwave Plasma Jet Chemical Vapor Deposition
Access this Article
Search this Article
The present research employs <I>in-situ</I> plasma Optical Emission Spectroscopy (OES) to explore the effect of microwave plasma jet chemical vapor deposition (MPJCVD) on activating CH<SUB>4</SUB>+H<SUB>2</SUB> plasma environment and synthesizing diamond film. Surface morphology and main orientation of lattice plane of the diamond synthesized under different processing parameters are also examined. Since species such as CH, H<SUB>2</SUB>, hydrogen Balmer alpha (H<SUB>α</SUB>), carbon dimer (C<SUB>2</SUB>) and hydrogen Balmer beta H<SUB>β</SUB> in the plasma radical are easily influenced by gas concentration, substrate temperature and processing parameters, <I>in-situ</I> OES is employed to diagnose <I>in-situ</I> OES diagnosing is employed to composition of plasma species in the synthesis of diamond film. Our findings reveal that species such as CH, C<SUB>2</SUB> and H<SUB>β</SUB> in microwave plasma jet have significant influence on grain size, surface morphology and H/C carbon concentration. The Raman spectrum measurement can prove the relationship between CH/C<SUB>2</SUB> species density and diamond surface morphology.
- Materials Transactions, JIM
Materials Transactions, JIM 49(6), 1380-1384, 2008-06-01
The Japan Institute of Metals and Materials