Nano Fabrication of Functional Transition Metal Oxide Thin Films

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  • SUZUKI Naoki
    JST-CREST The Institute of Scientific and Industrial Research, Osaka University
  • TANAKA Hidekazu
    JST-CREST The Institute of Scientific and Industrial Research, Osaka University
  • YANAGISAWA Yoshihiko
    The Institute of Scientific and Industrial Research, Osaka University
  • YAMANAKA Satoru
    The Institute of Scientific and Industrial Research, Osaka University
  • PELLEGRINO Luca
    The Institute of Scientific and Industrial Research, Osaka University
  • LEE Bong Kuk
    JST-CREST The Institute of Scientific and Industrial Research, Osaka University
  • LEE Hea Yeon
    JST-CREST The Institute of Scientific and Industrial Research, Osaka University
  • KAWAI Tomoji
    JST-CREST The Institute of Scientific and Industrial Research, Osaka University

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Other Title
  • 機能性遷移金属酸化物薄膜の極限ナノ加工
  • キノウセイ センイ キンゾク サンカブツ ハクマク ノ キョクゲン ナノ カコウ

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Abstract

  Transition metal oxide films show a rich variety of peculiar properties, such as ferroelectricity, ferromagnetism, high Tc superconductivity, colossal magnetoresistance, and so on. The method to process the oxide films down to nano scale is still under development. In this paper we introduce several techniques to process oxide films on the basis of AFM lithography and nanoimprint lithography. Using AFM based lithography, nanostructures of several tens nanometers have been realized. By Mo lift-off technique with nanoimprint lithography, we have obtained a large area dot array whose dot size is ~120 nm. These methods will lead to various room temperature functional oxide devices operated by light, electric field, magnetic field, and so on.<br>

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