軟X線多層膜鏡の形状誤差補正のための大面積イオン銃を用いたミリング装置の開発 Development of an Ion Milling System for Figure Error Correction of a Soft X-ray Multilayer Mirror

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  We have developed an ion beam milling system enabling effective, gentle and uniform milling of EUV multilayer surface of an imaging mirror for accurate compensation of the reflection phase error. An Ar ion beam of a large 150 mm in diameter accelerated at a low 500 V to avoid surface roughening is irradiated through a template selecting the areas of milling. The Ar beam profile has a quadratic distribution within 100 mm in diameter with an ion current of 0.1 mA/cm<sup>2</sup> at the center (<i>r</i>=0 mm) and of 40% less 0.06 mA/cm<sup>2</sup> at the peripheral (<i>r</i>=50 mm) as estimated by trench milling depth measured by an optical surface profiler (WYKO). This was also confirmed by a new detection system composed of an electrode array. A correction mask has been designed for even millig of the selected area of the sample. The milling rate of a Mo/Si multilayer with the uniform ion beam was found to be 2 min/period.<br>

収録刊行物

  • 真空  

    真空 51(3), 115-117, 2008-03-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021156838
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    18822398
  • NDL 記事登録ID
    9471281
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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