反射電子顕微鏡法とミクロ4端子プローブによる表面・電気伝導その場計測 In-situ Surface Conductivity Measurement by REM-M4PP Method

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著者

    • 籏野 慶佑 HATANO Keisuke
    • 東京農工大学工学府物理システム工学専攻 Department of Applied Physic, Tokyo University of Agriculture and Technology
    • 矢澤 博之 YAZAWA Hiroyuki
    • 東京農工大学工学府物理システム工学専攻 Department of Applied Physic, Tokyo University of Agriculture and Technology
    • 箕田 弘喜 MINODA Hiroki
    • 東京農工大学工学府物理システム工学専攻 Department of Applied Physic, Tokyo University of Agriculture and Technology

抄録

  We have developed a surface conductivity measurement system for a UHV electron microscope (UHV-EM). The sample surfaces were prepared in the UHV-EM and their structures were observed in situ by reflection electron microscopy and diffraction (REM-RHEED). After the sample preparation, the samples were cooled down to RT and the conductance measurement was carried out. The Si(111)-7×7 and Si(111)-√3×√3-Ag structures were used as sample surfaces which were prepared on the Si(111) vicinal surface inclined toward the [112] direction by 1°. The resistance of the 7×7 structure is much larger than that of the √3×√3-Ag structure and this is consistent with the previous report. This indicates that we can measure the surface conductivity by using our system.<br>

収録刊行物

  • 真空  

    真空 51(3), 149-151, 2008-03-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021156934
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    18822398
  • NDL 記事登録ID
    9471401
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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