パルスレーザー堆積法により作製したモリブデン酸化物光記録膜の光記録特性 Optical Recording Characteristics of the Molybdenum-Oxide Films Prepared with Pulsed Laser Deposition Method

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著者

    • 三代 一真 MISHIRO Kazuma
    • 大阪産業大学工学部電子情報通信工学科 Department of Electrical, Information and Communication, College of Engineering, Osaka Sangyo University
    • 青木 孝憲 AOKI Takanori
    • 大阪産業大学工学部電子情報通信工学科 Department of Electrical, Information and Communication, College of Engineering, Osaka Sangyo University
    • 鈴木 晶雄 [他] SUZUKI Akio
    • 大阪産業大学工学部電子情報通信工学科 Department of Electrical, Information and Communication, College of Engineering, Osaka Sangyo University
    • 松下 辰彦 MATSUSHITA Tatsuhiko
    • 大阪産業大学工学部電子情報通信工学科 Department of Electrical, Information and Communication, College of Engineering, Osaka Sangyo University

抄録

  Approximately 30 nm thick MoO<sub>3</sub> films were deposited on glass or polycarbonate substrates by Pulsed Laser Deposition Method using ArF excimer laser (λ=193 nm). For films deposited on glass substrates, transmittance change between the as-deposited and the annealed (340°C for 10 min) states was about 40% at the wavelength of 405 nm. This increase in transmittance was presumably caused by a transformation of oxygen-deficient as-deposited state into oxygen-sufficient annealed state through an annealing-induced reaction involving oxygen absorption, which was confirmed by XRD spectra. The value of CNR for 30 nm thick film grown on polycarbonates was about 50 dB at the write power of 3.0~11.0 mW. The value of CNR for 30 nm thick film with the protection layer of 30 nm was 50 dB at the peak power of 9.0~17.0 mW. These results give a characteristic feature of the wide write-power margin.<br>

収録刊行物

  • 真空  

    真空 51(3), 188-191, 2008-03-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021157028
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    18822398
  • NDL 記事登録ID
    9471533
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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