Measurement and Control of High Energy Particles in Sputter Plasma

• TOYODA Hirotaka

  Department of Electrical Engineering and Computer Science, Nagoya University

Bibliographic Information

Other Title

• スパッタプラズマ中の高エネルギー粒子計測と制御
• スパッタ プラズマチュウ ノ コウエネルギー リュウシ ケイソク ト セイギョ

Abstract

  Measurement and control of high-energy Ar species in the magnetron plasma source is discussed. From energy distribution measurement of Ar⁺ in the plasma, existence of high-energy Ar atoms in the magnetron plasma source is confirmed. It is concluded that collision of high-energy Ar atom with background thermal Ar atom is the dominant ionization mechanism for the production of high-energy Ar⁺. Based on this ionization mechanism, a Monte Carlo code is developed to simulate the Ar⁺ energy distribution and the results are in good agreement with the experimental ones. A new technique to suppress high-energy Ar species i.e., VHF-DC superimposed magnetron sputter source, is proposed. Compared with conventional magnetron sputter sources, this new sputter source shows lower Ar energy, which is consistent with the simulation result. The VHF-DC superimposed magnetron plasma is successfully applied to the deposition of magnetic multilayer films with very thin (<1 nm) layer thickness and good magnetic anisotropy.<br>

Journal

• Journal of the Vacuum Society of Japan

  Journal of the Vacuum Society of Japan 51 (4), 258-263, 2008

  The Vacuum Society of Japan

Keywords

• Spectroscopy
• Surfaces and Interfaces
• Instrumentation
• General Materials Science

Details

• CRID: 1390001205295082240
• NII Article ID: 10021157266
• NII Book ID: AA12298652
• DOI: 10.3131/jvsj2.51.258
• BIBCODE: 2008JVSJ...51..258T
• COI: 1:CAS:528:DC%2BD1cXntFCqsr4%3D
• ISSN: 18824749
• ISSN: 18822398
• NDL BIB ID: 9501319
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9501319
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
  • KAKEN
• Abstract License Flag: Disallowed