外的応力が及ぼす表面反応ダイナミクス変化 Influence of External Stress on the Surface Reaction Dynamics

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著者

    • 矢田 雅規 YATA Masanori
    • 独立行政法人 物質・材料研究機構 量子ドットセンター Quantum Dot Center, National Institute for Materials Science

抄録

  It has been demonstrated by previous studies that the chemisorption of molecules or atoms onto a solid surface can alter its intrinsic stress. Now this process has been turned on its head, with the chemical reactivity of the surface being altered by external stress. We report herein how the dissociation reactions of O<sub>2</sub> on Cu(001), O covered Cu(001), and Si(001) surfaces are influenced by the stress. In each case the activation barriers for direct dissociation and/or for trapping precursor-mediated dissociation and the depth of trapping well are sensitively altered by the externally applied tensile stress. These results revealed that stress could significantly altered surface reactivity, and that the stress has the potential to control the surface reactions as well as the dynamics.<br>

収録刊行物

  • 真空  

    真空 51(5), 279-284, 2008-05-20 

    The Vacuum Society of Japan

参考文献:  34件

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各種コード

  • NII論文ID(NAID)
    10021157305
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    18822398
  • NDL 記事登録ID
    9540883
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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