サーモリフレクタンス法によるTiN_x薄膜の熱拡散率の測定 Analysis of Thermal Diffusivity for TiN_x Thin Films Using Thermoreflectance Technique

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著者

    • 八木 貴志 YAGI Takashi
    • 産業技術総合研究所計測標準研究部門 National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST)
    • 竹歳 尚之 TAKETOSHI Naoyuki
    • 産業技術総合研究所計測標準研究部門 National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST)
    • 馬場 哲也 BABA Tetsuya
    • 産業技術総合研究所計測標準研究部門 National Metrology Institute of Japan, National Institute of Advanced Industrial Science and Technology (AIST)

抄録

  Thermal diffusivity of titanium nitride (TiN<sub>x</sub>) films normal to the film surface was measured quantitatively using a thermoreflectance technique. TiN<sub>x</sub> films were deposited on alkali free glass substrate by reactive rf magnetron sputtering using a Ti metal target and mixture gas of Ar and N<sub>2</sub>. Nitrogen compositions of the film were determined from plasma energy using Bendavid's relation. The ratio of nitrogen to titanium atoms increased from 0.8 to 1.2 when reactive N<sub>2</sub> gas composition changed from 4.7% to 100% at the deposition process. For the stoichiometric film, the thermal diffusivity shows peak value, as well as the electrical conductivity. In contrast, when nitrogen composition becomes to over- or under-stoichiometry, both thermal diffusivity and electrical conductivity rapidly decrease, respectively. The relationship between the thermal diffusivity and the electric conductivity suggests that the free electron contribution is dominant to the heat conduction in the TiN<sub>x</sub> films.<br>

収録刊行物

  • 真空

    真空 51(6), 382-385, 2008-06-20

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021157706
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    18822398
  • NDL 記事登録ID
    9571175
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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