多重磁極型高周波マグネトロンスパッタ法によるCo薄膜の基板温度依存性 Dependence on Substrate Temperature of the Properties of Co Thin Films Fabricated by RF Magnetron Sputtering with Multipolar Magnetic Plasma Confinement

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著者

    • 桑原 豪 KUWABARA Tsuyoshi
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic System Engineering, Hiroshima Institute of Technology
    • 後藤 貴則 GOTOU Takanori
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic System Engineering, Hiroshima Institute of Technology
    • 田中 一学 TANAKA Ichigaku
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic System Engineering, Hiroshima Institute of Technology
    • 川畑 敬志 KAWABATA Keishi
    • 広島工業大学工学部電子・光システム工学科 Department of Electronics and Photonic System Engineering, Hiroshima Institute of Technology

抄録

  The dependence on substrate temperature of the structural properties of Co thin films deposited on silicon substrates by RF magnetron sputtering with multipolar magnetic plasma confinement (MMPC) was investigated. The structure of the Co films was characterized by X-ray diffraction (XRD), and their surface morphology by atomic force microscopy (AFM). It was found that the surface morphology depended strongly on the substrate temperature. The surface of Co thin films deposited at 400°C exhibited round connected textures with a maximum Rq (root mean square roughness) of 5.48 nm, while the films deposited at room temperature exhibited salient connected textures with an Rq of less than 1.18 nm. Furthermore, the XRD spectrum intensity observed for the Co films deposited at 400°C was higher than that of the films deposited at room temperature.<br>

収録刊行物

  • 真空  

    真空 51(6), 405-407, 2008-06-20 

    The Vacuum Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021157758
  • NII書誌ID(NCID)
    AN00119871
  • 本文言語コード
    JPN
  • 資料種別
    SHO
  • ISSN
    18822398
  • NDL 記事登録ID
    9571246
  • NDL 雑誌分類
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号
    Z16-474
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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