Effect of Substrate DC Bias Voltage and Anode Voltage on the Properties of Cu Films Using Magnetron Sputtering with Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma

• MURAOKA Yuuki

  Department of Electronics and Photonic Systems, Hiroshima Institute of Technology

• EBOSHI Ryo

  Department of Electronics and Photonic Systems, Hiroshima Institute of Technology

• KUROKAWA Shigeo

  Department of Electronics and Photonic Systems, Hiroshima Institute of Technology

• TATIBANA Akihiro

  Department of Electronics and Photonic Systems, Hiroshima Institute of Technology

• HASUI Yuki

  Department of Electronics and Photonic Systems, Hiroshima Institute of Technology

• KAWABATA Keishi

  Department of Electronics and Photonic Systems, Hiroshima Institute of Technology

Bibliographic Information

Other Title

• 誘導結合プラズマ支援型多重磁極マグネトロンスパッタ法により作製したＣｕ薄膜に及ぼす陽極電圧と基板バイアス電圧の効果
• ユウドウ ケツゴウ プラズマ シエンガタ タジュウ ジキョク マグネトロン スパッタホウ ニ ヨリ サクセイシタ Cu ハクマク ニ オヨボス ヨウキョク デンアツ ト キバン バイアス デンアツ ノ コウカ

Abstract

  The effect of substrate dc bias voltage (V_S) and anode dc voltage (V_A) on the properties of Cu thin films using magnetron sputtering with multipolar magnetic plasma confinement assisted by inductively coupled plasma (MMPC-ICP) was characterized by X-ray diffraction (XRD) and Atomic Force Microscope (AFM). The anode electrode was placed at a distance of 10 mm from the substrate in the MMPC-ICP system in order to increase the plasma density near the substrate. It is demonstrated that an increase in V_A results in a decrease in the V_S voltage at which the substrate current begins to saturate. The Cu thin films were prepared by changing the substrate dc bias voltage from -100 V to 0 V at the different anode voltages ranging from 0 V to 40 V. It is shown that the Cu film deposited at V_A=40 V and V_S=-20 V has a maximum grain size of about 430 nm; this value is about 5 times higher than that at V_A=0 V and V_S=-20 V.<br>

Journal

• Journal of the Vacuum Society of Japan

  Journal of the Vacuum Society of Japan 51 (6), 408-411, 2008

  The Vacuum Society of Japan

Keywords

• Spectroscopy
• Surfaces and Interfaces
• Instrumentation
• General Materials Science

Details

• CRID: 1390001205295917824
• NII Article ID: 10021157765
• NII Book ID: AA12298652
• DOI: 10.3131/jvsj2.51.408
• ISSN: 18824749
• ISSN: 18822398
• NDL BIB ID: 9571266
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I9571266
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed