TOF-SIMSによるめっき膜中に取り込まれためっき液添加剤の挙動解明 Research on Behavior of an Electro-plating Additive in Electro-Plated Films by TOF-SIMS

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Using TOF-SIMS, we found that the NiO<sub>2</sub>/NiSO/NiS multi-layers are formed at the surface of an FeNi plated film in nanometer scale by adding sodium saccharin into the plating bath, and that these multi-layers reduce oxygen inclusion into the plated film while plating, preventing natural oxidation of the surface of the film. Also, using AES, we found the presence of a Ni rich layer just under the NiO<sub>2</sub>/NiSO/NiS multi-layers. Next, we plated an FeNi film in a plating bath without sodium saccharin onto an FeNi film which had been previously plated in another plating bath with sodium saccharin, and found that NiS which had existed at the surface of the lower film moved to the surface of the upper film. We also found that the surface structure of these double films is the same as that of a single FeNi film plated in a bath with sodium saccharin, when the upper film is thin enough.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 59(2), 138-144, 2008-02-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021169447
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    9370790
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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