ジンケート処理におけるアルミニウム合金表面のXPSによる検討 XPS Studies of the Al Alloy Surface with Zincate Treatment

この論文にアクセスする

この論文をさがす

著者

抄録

It is well known that the adhesion strength of metal plating film on Al substrate should be remarkably improved by introducing double zincate treatment as a pretreatment process for metal plating on Al. At each step of alkaline etching, desmutting, the first zincate treatment, HNO<sub>3</sub> dipping, and the second zincate treatment in the double zincate process, depth profiles and the chemical state of the surface elements were extensively measured by XPS. A set of surface structure models in the process was proposed to explain the improvement of the adhesion strength by double zincate treatment.<br>By dipping the first zincate film in HNO<sub>3</sub> solution, a granular zinc deposit of about 1 μm thickness, roughly deposited on Al passivation film at the first zincate treatment, was dissolved, and zinc nano-particles were believed to be concurrently formed in the Al passivation film of about 3nm thickness. In the second zincate treatment the nano-particles should be exposed to the second zincate solution to act as nuclei for formation of a highly uniform and thin zinc film. The zinc particles were so close to the metallic Al substrate, that Dipolar coupling such as Al<sup><i>δ</i>+</sup>…O<sup><i>δ</i>−</sup>…Zn<sup><i>δ</i>+</sup> would act to improve the adhesion strength of double zincate film on Al substrate.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 59(4), 257-264, 2008-04-01 

    The Surface Finishing Society of Japan

参考文献:  17件

参考文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

被引用文献:  1件

被引用文献を見るにはログインが必要です。ユーザIDをお持ちでない方は新規登録してください。

各種コード

  • NII論文ID(NAID)
    10021169780
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    9455036
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
ページトップへ