フォトリソグラフィとアノード酸化を利用したAl薄膜の表面加工 Surface Patterning of Al Thin Film Using Photolithography and Anodization

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This paper addresses a new method of surface patterning for thin aluminum films using photolithography, anodization, and chemical etching. Aluminum film with a thickness of about 150nm was deposited on titanium-coated silicon or slide glass substrates. Subsequently, square masks were patterned on the aluminum film using photolithography. While aluminum film was anodized in 1vol% sulfuric acid, an anodic oxide film formed in the photoresist/aluminum film interface in addition to on open surface regions. In this process, the thickness of the anodic oxide film formed under the photoresist was affected by the bath voltage and the thickness of the titanium layer. Since the thickness of the anodic oxide at open surface regions and at masked regions differed, a patterned surface was developed. In order to examine the surface morphology, the anodic oxide film was removed by chemical etching in 21vol% phosphoric acid. As result, the anodic oxide film was removed, leaving an aluminum film of convex shape on the substrate.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan

    表面技術 = The Journal of the Surface Finishing Society of Japan 59(5), 333-339, 2008-05-01

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021169939
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    9503269
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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