Surface Patterning of Al Thin Film Using Photolithography and Anodization
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- KATSUMATA Nobuyuki
- Yamanashi Prefectural Industrial Technology Center
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- ISHIDA Masafumi
- Yamanashi Prefectural Industrial Technology Center
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- SAITO Osamu
- Yamanashi Prefectural Industrial Technology Center
Bibliographic Information
- Other Title
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- フォトリソグラフィとアノード酸化を利用したAl薄膜の表面加工
- フォトリソグラフィ ト アノード サンカ オ リヨウシタ Al ハクマク ノ ヒョウメン カコウ
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Abstract
This paper addresses a new method of surface patterning for thin aluminum films using photolithography, anodization, and chemical etching. Aluminum film with a thickness of about 150nm was deposited on titanium-coated silicon or slide glass substrates. Subsequently, square masks were patterned on the aluminum film using photolithography. While aluminum film was anodized in 1vol% sulfuric acid, an anodic oxide film formed in the photoresist/aluminum film interface in addition to on open surface regions. In this process, the thickness of the anodic oxide film formed under the photoresist was affected by the bath voltage and the thickness of the titanium layer. Since the thickness of the anodic oxide at open surface regions and at masked regions differed, a patterned surface was developed. In order to examine the surface morphology, the anodic oxide film was removed by chemical etching in 21vol% phosphoric acid. As result, the anodic oxide film was removed, leaving an aluminum film of convex shape on the substrate.
Journal
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- Journal of The Surface Finishing Society of Japan
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Journal of The Surface Finishing Society of Japan 59 (5), 333-339, 2008
The Surface Finishing Society of Japan
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Details 詳細情報について
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- CRID
- 1390001204116805888
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- NII Article ID
- 10021169939
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- NII Book ID
- AN1005202X
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- ISSN
- 18843409
- 09151869
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- NDL BIB ID
- 9503269
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- Text Lang
- ja
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- Data Source
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- Abstract License Flag
- Disallowed