大気中無潤滑下におけるDLC-Si膜の低摩擦特性 Low Friction Property of DLC-Si Films under Dry Sliding Condition

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The aim of this study is to examine the effect of silicon in DLC-Si films on friction properties, and to clarify the mechanism of low friction under dry sliding conditions. The friction coefficient of DLC-Si films was measured using a ball-on-disk type tester at a load of 10N and a sliding velocity of 0.2m/s with no lubricant in an ambient air atmosphere. Compared to DLC films without Si, DLC-Si films exhibited an extremely low friction coefficient (about 0.05) ranging from 4 to 17at. % in silicon. On the wear surface of DLC-Si coated disks, the formation of Si-OH was eventually detected using derivatization-XPS. In order to explain the relation between Si-OH formation and low friction behavior, model samples with Si-OH, Si-H and their mixture on the silicon wafer were prepared, and the friction coefficient of the samples was measured with a ball-on-plate type tester. Compared to Si-H, Si-OH had a lower friction coefficient. Furthermore, Si-OH surface analyzed by ATR-IR showed spectra with broad band at around 3400cm<sup>−1</sup>, indicating the existence of adsorbed water on the Si-OH surface. From the results obtained, it was suggested that DLC-Si films exhibited a low friction property caused by the formation of Si-OH and adsorbed water in it under the dry sliding condition.

収録刊行物

  • 表面技術 = The Journal of the Surface Finishing Society of Japan  

    表面技術 = The Journal of the Surface Finishing Society of Japan 59(6), 401-407, 2008-06-01 

    The Surface Finishing Society of Japan

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各種コード

  • NII論文ID(NAID)
    10021170197
  • NII書誌ID(NCID)
    AN1005202X
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09151869
  • NDL 記事登録ID
    9531244
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-291
  • データ提供元
    CJP書誌  CJP引用  NDL  J-STAGE 
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