プラズマCVD法による歯科金属材料へのTiO_2コーティング Preparation of TiO_2 Coating on Dental Metal Materials by Plasma CVD
In this study, TiO<SUB>2</SUB> films were prepared on Ag-Pd alloys by Plasma-enhanced Chemical Vapor Deposition (PECVD) using Ti(O-<I>i</I>-Pr)<SUB>2</SUB>(dpm)<SUB>2</SUB> precursor. Ag-Pd alloys are widely used as a substrate material of a resin-veneered dental crown. Since an adhesion of a dental resin to the Ag-Pd alloy substrate is poor, protuberances are usually formed on the substrate surface to sustain the mechanical retention. One of the weak points in the resin-veneered dental crown is that a mechanical retention should be indispensable to fix the resin onto the metal frame. Instead of mechanical retention, TiO<SUB>2</SUB> films were prepared on the substrates.<BR>The effects of the deposition conditions on the crystalline phases, microstructures, and color of the deposited films were investigated. As a result, at a substrate pre-heating temperature T<SUB>dep</SUB>=500°C, microwave power P<SUB>M</SUB>=2 kW, deposition pressure P<SUB>tot</SUB>=0.4 or 0.7 kPa, the film color changed from black to white, and crystalline phase was anatase. And the microstructure of the film was granular. The grain size was a diameter of about 100 nm. These are optimum deposition conditions.
粉体および粉末冶金 55(5), 331-335, 2008-05-15
Japan Society of Powder and Powder Metallurgy