Recent Progress of Highly Sensitive Photo-Polymerization Initiation

DOI Web Site 2 Citations 85 References
  • Aoai Toshiaki
    Synthetic Organic Chemistry Laboratories, Research & Development Management Headquarters, FUJIFILM Corporation

Bibliographic Information

Other Title
  • 高感度光重合開始系の最近の進歩
  • コウカンド ヒカリ ジュウゴウ カイシケイ ノ サイキン ノ シンポ

Search this article

Abstract

A photopolymer material has been widely used in negative-type photosensitive composition (e.g. as a radical or an acid catalyzed polymerization). A large number of photo-initiator com-pounds for these compositions have been developed corresponding to many industrial demands such as coatings (overcoats, adhesives), graphic materials (printing plates, inks), electronic materi-als (printed circuit, micro-resist, color filter), and recording materials (holography). With recent development of light source especially for IR, Visible, and UV lasers, there is a growing interest to increase their photo-sensitivity. To perform much higher sensitivity, dye sensitizers are usually utilized in both radical and cationic photo-polymerization, and are elaborately designed in combi-nation of initiators. The dye sensitization is mainly classified into 1) electron transfer mechanism and 2) energy transfer mechanism. The dyes, therefore, are controlled and adjusted to their physi-cal properties such as wave length, redox potential, and excited energy level according to the mechanism. In this paper, the classification of these initiators/dye sensitizers and their character-istics are shortly described. Furthermore a few recent applications are introduced as an example of high sensitive material.

Journal

Citations (2)*help

See more

References(85)*help

See more

Keywords

Details 詳細情報について

Report a problem

Back to top