細管内壁へのTiNコーティングの研究 Titanium nitride coatings to inner wall of narrow tube

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著者

    • HAYAKAWA Koichi
    • Department of Applied Science, Graduate School of Engineering, Tokai University
    • TANAKAMARU Tempei
    • Department of Applied Science, Graduate School of Engineering, Tokai University
    • ONO Yusuke
    • Department of Applied Science, School of Engineering, Tokai University

抄録

Titanium nitride TiN shows considerable hydrogen impermeability and is expected as a prevention coating of hydrogen gas for a cladding tube of metal hydride fission fuel. The TiN coating produce with plasma process is very complicated because the cladding tube is not wide enough to create stable plasma. In this study, a simple reactive evaporation process was selected for coationg process of TiN films to inner wall of narrow tube. The films were thermally deposited on stainless steel sheets were coiled around inner wall of silica glass tubes. Nitrogen as a reactive gas was introduced into the vacuum chamber with pressure of 1.0×10<sup>-1</sup> Pa. As results, thin films with gold color were obtained. From XRD measurement of films, distinct diffraction patterns of TiN phase were observed. In this syudy, a reactivity of N<sub>2</sub> gas molecules with Ti atoms in Ti-N film formation has measured quantitatively. As results, the reaction probability of N<sub>2</sub> molecules r<sub>N2</sub> is defined as the ratio of the absorbing rate of N<sub>2</sub> on Ti surface A<sub>N2</sub> to the rate of N<sub>2</sub> impingement Z<sub>N2</sub>. Reactive evaporation process showed r<sub>N2</sub> ≅ 0.013. It was 1/5 of r<sub>N2</sub> with Ti film prepared by plasma processes.

Titanium nitride TiN shows considerable hydrogen impermeability and is expected as a prevention coating of hydrogen gas for a cladding tube of metal hydride fission fuel. The TiN coating produce with plasma process is very complicated because the cladding tube is not wide enough to create stable plasma. In this study, a simple reactive evaporation process was selected for coationg process of TiN films to inner wall of narrow tube. The films were thermally deposited on stainless steel sheets were coiled around inner wall of silica glass tubes. Nitrogen as a reactive gas was introduced into the vacuum chamber with pressure of 1.0×10<sup>-1</sup> Pa. As results, thin films with gold color were obtained. From XRD measurement of films, distinct diffraction patterns of TiN phase were observed. In this syudy, a reactivity of N<sub>2</sub> gas molecules with Ti atoms in Ti-N film formation has measured quantitatively. As results, the reaction probability of N<sub>2</sub> molecules r<sub>N2</sub> is defined as the ratio of the absorbing rate of N<sub>2</sub> on Ti surface A<sub>N2</sub> to the rate of N<sub>2</sub> impingement Z<sub>N2</sub>. Reactive evaporation process showed r<sub>N2</sub> ≅ 0.013. It was 1/5 of r<sub>N2</sub> with Ti film prepared by plasma processes.

収録刊行物

  • Journal of advanced science

    Journal of advanced science 19(3), 55-58, 2008-02-29

    Society of Advanced Science

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各種コード

  • NII論文ID(NAID)
    10021874944
  • NII書誌ID(NCID)
    AA11948435
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    09155651
  • データ提供元
    CJP書誌  J-STAGE 
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