ナノ粒子を使用したガスデポジション成膜装置とその応用

• 渕田 英嗣

  有限会社渕田ナノ技研

書誌事項

タイトル別名

• Gas Deposition Apparatus Using Nanoparticles as Coating and Those Applications
• ナノ リュウシ オ シヨウシタ ガス デポジション セイマク ソウチ ト ソノ オウヨウ

抄録

This paper introduces dry film fabrication systems, i.e., Gas Deposition (GD) system and Aerosol Gas Deposition (AGD) system, and their applied fields. Nanoparticles of inorganic materials can be formed by the gas evaporation method (the gas condensation method) . In gas deposition method, particles formed by the gas evaporation method in an evaporation chamber are transported to another chamber (a deposition chamber) through a transfer pipe. Particles are accelerated in the pipe with a gas flow and ejected through a nozzle to form a film in the deposition chamber which is evacuated at a pressure lower than 1 kPa. With the aerosol gas deposition method, particles formed elsewhere are dispersed into a gas flow and ejected through a wide nozzle to form films. Ceramics particles are deposited on a substrate, forming a high density film with a strong adhesion under a room temperature condition.

収録刊行物

• エアロゾル研究

  エアロゾル研究 22 (1), 26-33, 2007

  日本エアロゾル学会

キーワード

• Gas Deposition Method
• Nanoparticle
• Gas Evaporation Method
• Mask-Less & Direct Printing
• Aerosol Gas Deposition Method
• Dry Film Making
• Low Temperature Process

詳細情報

• CRID: 1390282679319833600
• NII論文ID: 10021918040
• NII書誌ID: AN10041511
• DOI: 10.11203/jar.22.26
• ISSN: 1881543X
• ISSN: 09122834
• NDL書誌ID: 8750266
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8750266
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • NDL
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可