ナノ粒子を使用したガスデポジション成膜装置とその応用 Gas Deposition Apparatus Using Nanoparticles as Coating and Those Applications

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This paper introduces dry film fabrication systems, i.e., Gas Deposition (GD) system and Aerosol Gas Deposition (AGD) system, and their applied fields. Nanoparticles of inorganic materials can be formed by the gas evaporation method (the gas condensation method) . In gas deposition method, particles formed by the gas evaporation method in an evaporation chamber are transported to another chamber (a deposition chamber) through a transfer pipe. Particles are accelerated in the pipe with a gas flow and ejected through a nozzle to form a film in the deposition chamber which is evacuated at a pressure lower than 1 kPa. With the aerosol gas deposition method, particles formed elsewhere are dispersed into a gas flow and ejected through a wide nozzle to form films. Ceramics particles are deposited on a substrate, forming a high density film with a strong adhesion under a room temperature condition.

収録刊行物

  • エアロゾル研究 = Journal of aerosol research  

    エアロゾル研究 = Journal of aerosol research 22(1), 26-33, 2007-03-20 

    日本エアロゾル学会

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各種コード

  • NII論文ID(NAID)
    10021918040
  • NII書誌ID(NCID)
    AN10041511
  • 本文言語コード
    JPN
  • 資料種別
    REV
  • ISSN
    09122834
  • NDL 記事登録ID
    8750266
  • NDL 雑誌分類
    ZP5(科学技術--化学・化学工業--化学工学)
  • NDL 請求記号
    Z17-1062
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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