Gas Deposition Apparatus Using Nanoparticles as Coating and Those Applications

• FUCHITA Eiji

  Fuchita Nanotechnology Ltd.

Bibliographic Information

Other Title

• ナノ粒子を使用したガスデポジション成膜装置とその応用
• ナノ リュウシ オ シヨウシタ ガス デポジション セイマク ソウチ ト ソノ オウヨウ

Abstract

This paper introduces dry film fabrication systems, i.e., Gas Deposition (GD) system and Aerosol Gas Deposition (AGD) system, and their applied fields. Nanoparticles of inorganic materials can be formed by the gas evaporation method (the gas condensation method) . In gas deposition method, particles formed by the gas evaporation method in an evaporation chamber are transported to another chamber (a deposition chamber) through a transfer pipe. Particles are accelerated in the pipe with a gas flow and ejected through a nozzle to form a film in the deposition chamber which is evacuated at a pressure lower than 1 kPa. With the aerosol gas deposition method, particles formed elsewhere are dispersed into a gas flow and ejected through a wide nozzle to form films. Ceramics particles are deposited on a substrate, forming a high density film with a strong adhesion under a room temperature condition.

Journal

• Earozoru Kenkyu

  Earozoru Kenkyu 22 (1), 26-33, 2007

  Japan Association of Aerosol Science and Technology

Keywords

• Gas Deposition Method
• Nanoparticle
• Gas Evaporation Method
• Mask-Less & Direct Printing
• Aerosol Gas Deposition Method
• Dry Film Making
• Low Temperature Process

Details

• CRID: 1390282679319833600
• NII Article ID: 10021918040
• NII Book ID: AN10041511
• DOI: 10.11203/jar.22.26
• ISSN: 1881543X
• ISSN: 09122834
• NDL BIB ID: 8750266
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8750266
• Text Lang: ja
• Data Source:
  • JaLC
  • NDL
  • CiNii Articles
• Abstract License Flag: Disallowed