アルミニウムアノード酸化ポーラス皮膜の孔発生過程に及ぼす素地結晶方位および表面トポグラフィの影響 Influence of crystal orientation and surface topography of aluminum substrate on pore nucleation of anodic porous alumina

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Pore nucleation and growth processes of anodic oxide films formed on aluminum substrate were investigated by atomic force microscopy with focusing on the crystal orientation and surface topography of aluminum substrate. Nanotopographies of electropolished aluminum were extremely affected by the crystal orientation of aluminum substrate. For as-received aluminum, regularly aligned striped structure appeared after electropolishing. On the other hand, aluminum substrate annealed at 300°C exhibited isotropic hexagonal cell structure. From X-ray diffraction patterns, it was confirmed that the preferential crystal orientation of aluminum was changed from (110) to (100) when annealing temperature was higher than 300°C. In the initial stage of anodization, specific nanotopography of electropolished aluminum surface was served as the initiation sites for pore generation, and accordingly it influenced cell arrangement. Using planarized aluminum with less than 0.3 nm asperities, however, a large number of fine pores initiated on the oxide film surface. Thus, the growth of anodic oxide films was seriously influenced by the surface topography of aluminum substrate.

収録刊行物

  • 軽金属  

    軽金属 58(8), 375-380, 2008-08-30 

    The Japan Institute of Light Metals

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各種コード

  • NII論文ID(NAID)
    10021989556
  • NII書誌ID(NCID)
    AN00069773
  • 本文言語コード
    JPN
  • 資料種別
    ART
  • ISSN
    04515994
  • NDL 記事登録ID
    9633344
  • NDL 雑誌分類
    ZP41(科学技術--金属工学・鉱山工学)
  • NDL 請求記号
    Z17-284
  • データ提供元
    CJP書誌  NDL  J-STAGE 
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