Copper Metallization for High-Speed ECL-CMOS LSI's
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- OHASHI N.
- Device Development Center, Hitachi, Ltd.
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- SAITO T.
- Device Development Center, Hitachi, Ltd.
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- HASHIMOTO T.
- Device Development Center, Hitachi, Ltd.
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- NOGUCHI J.
- Device Development Center, Hitachi, Ltd.
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- IMAI T.
- Device Development Center, Hitachi, Ltd.
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- SASAJIMA K.
- Device Development Center, Hitachi, Ltd.
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- YAMAGUCHI H.
- Device Development Center, Hitachi, Ltd.
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- OWADA N.
- Device Development Center, Hitachi, Ltd.
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収録刊行物
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 1999 496-497, 1999-09-20
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- CRID
- 1570854175635320448
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- NII論文ID
- 10022537290
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- NII書誌ID
- AA10777858
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- 本文言語コード
- en
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- データソース種別
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