Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO_2 Metal Gate Stacks
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- SASAKI Takaoki
- Semiconductor Leading Edge Technologies Inc.
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- AKASAKA Yasushi
- Semiconductor Leading Edge Technologies Inc.
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- MIYAGAWA Kazuhiro
- Semiconductor Leading Edge Technologies Inc.
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- HOSHI Takeshi
- Semiconductor Leading Edge Technologies Inc.
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- WATANABE Yasuhiko
- Semiconductor Leading Edge Technologies Inc.
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- OOTSUKA Fumio
- Semiconductor Leading Edge Technologies Inc.
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- YASUHIRA Mitsuo
- Semiconductor Leading Edge Technologies Inc.
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- ARIKADO Tsunetoshi
- Semiconductor Leading Edge Technologies Inc.
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Journal
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- Extended abstracts of the ... Conference on Solid State Devices and Materials
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Extended abstracts of the ... Conference on Solid State Devices and Materials 2004 200-201, 2004-09-15
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Details 詳細情報について
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- CRID
- 1570572700658441984
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- NII Article ID
- 10022538200
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- NII Book ID
- AA10777858
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- Text Lang
- en
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- Data Source
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- CiNii Articles