A Novel STI Process from the View Point of Total Strain Process Design for 45nm Node Devices and Beyond

• ISHIBASHI M.

  Process Technology Development Div, Renesas Technology Corp.

• HORITA K.

  Process Technology Development Div, Renesas Technology Corp.

• SAWADA M.

  Process Technology Development Div, Renesas Technology Corp.

• KITAZAWA M.

  Process Technology Development Div, Renesas Technology Corp.

• IGARASHI M.

  Process Technology Development Div, Renesas Technology Corp.

• KUROI T.

  Process Technology Development Div, Renesas Technology Corp.

• EIMORI T.

  Process Technology Development Div, Renesas Technology Corp.

• KOBAYASHI K.

  Process Technology Development Div, Renesas Technology Corp.

• INUISHI M.

  Process Technology Development Div, Renesas Technology Corp.

• OHJI Y.

  Process Technology Development Div, Renesas Technology Corp.

収録刊行物

• Extended abstracts of the ... Conference on Solid State Devices and Materials

  Extended abstracts of the ... Conference on Solid State Devices and Materials 2004 720-721, 2004-09-15

詳細情報

• CRID: 1571698600565240704
• NII論文ID: 10022539862
• NII書誌ID: AA10777858
• 本文言語コード: en
• データソース種別:
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