Fabrication of nanoscaled-schottky diodes based on metal silicide/silicon nanowire with scanning probe lithography and Wet etching and its electrical characterization

• SHEU J. T.

  Institute of Nanotechnology, National Chaio Tung University

• YEH S. P.

  Institute of Electrical Engineering, National Tsing Hua University

• TSAI S. T.

  Department of Electrical Engineering, National Chi Nan University

• LIEN C. H.

  Institute of Electrical Engineering, National Tsing Hua University

収録刊行物

• Extended abstracts of the ... Conference on Solid State Devices and Materials

  Extended abstracts of the ... Conference on Solid State Devices and Materials 2005 782-783, 2005-09-13

詳細情報

• CRID: 1571135650625117312
• NII論文ID: 10022543222
• NII書誌ID: AA10777858
• 本文言語コード: en
• データソース種別:
  • CiNii Articles