Direct Silicon Bonded (DSB) Mixed Orientation Substrate for High Performance Bulk CMOS Technology

  • SUNG C. Y.
    Research Division, T.J. Watson Research Center
  • YIN Haizhou
    Semiconductor Research & Development Center Microelectronic Division
  • NG H.
    Semiconductor Research & Development Center Microelectronic Division
  • SAENGER K. L.
    Research Division, T.J. Watson Research Center
  • PFEIFFER G.
    Semiconductor Research & Development Center Microelectronic Division
  • CHAN V.
    Semiconductor Research & Development Center Microelectronic Division
  • ZHANG R.
    Semiconductor Research & Development Center Microelectronic Division
  • LI J.
    Semiconductor Research & Development Center Microelectronic Division
  • OTT J. A.
    Research Division, T.J. Watson Research Center
  • BENDERNAGEL R.
    Semiconductor Research & Development Center Microelectronic Division
  • KO S. B.
    Semiconductor Research & Development Center Microelectronic Division
  • REN Z.
    Semiconductor Research & Development Center Microelectronic Division
  • CHEN X.
    Semiconductor Research & Development Center Microelectronic Division
  • KU V.
    Semiconductor Research & Development Center Microelectronic Division
  • LUO Z. J.
    Semiconductor Research & Development Center Microelectronic Division
  • ROVEDO N.
    Semiconductor Research & Development Center Microelectronic Division
  • FOGEL K.
    Research Division, T.J. Watson Research Center
  • KHARE M.
    Research Division, T.J. Watson Research Center
  • SHAHIDI G.
    Research Division, T.J. Watson Research Center
  • CROWDER S.
    Semiconductor Research & Development Center Microelectronic Division

この論文をさがす

収録刊行物

参考文献 (9)*注記

もっと見る

詳細情報 詳細情報について

  • CRID
    1570291225695270528
  • NII論文ID
    10022544664
  • NII書誌ID
    AA10777858
  • 本文言語コード
    en
  • データソース種別
    • CiNii Articles

問題の指摘

ページトップへ