Guiding Principle of Energy Level Controllability of Silicon Dangling Bond in HfSiON

  • UMEZAWA N.
    Advanced Electronic Materials Center, National Institute for Materials Science
  • SHIRAISHI K.
    Graduate School of Pure and Applied Sciences, Univ. of Tsukuba
  • MIYAZAKI S.
    Graduate School of Advanced Sciences of Matter, Hiroshima Univ.
  • UEDONO A.
    Graduate School of Pure and Applied Sciences, Univ. of Tsukuba
  • AKASAKA Y.
    Semiconductor Leading Edge Technology Inc.
  • INUMIYA S.
    Semiconductor Leading Edge Technology Inc.
  • HASUNUMA R.
    Graduate School of Pure and Applied Sciences, Univ. of Tsukuba
  • YAMABE K.
    Graduate School of Pure and Applied Sciences, Univ. of Tsukuba
  • MOMIDA H.
    Computational Materials Science Center, National Institute for Materials Science
  • OHNO T.
    Computational Materials Science Center, National Institute for Materials Science
  • OHMORI K.
    Advanced Electronic Materials Center, National Institute for Materials Science
  • CHIKYOW T.
    Advanced Electronic Materials Center, National Institute for Materials Science
  • NARA Y.
    Semiconductor Leading Edge Technology Inc.
  • YAMADA K.
    Nanotechnology Research Laboratories, Waseda University

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詳細情報 詳細情報について

  • CRID
    1574231875369363328
  • NII論文ID
    10022545733
  • NII書誌ID
    AA10777858
  • 本文言語コード
    en
  • データソース種別
    • CiNii Articles

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