Effect of Ar/Ar-H2 plasma arc melting on Cu purification

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  • Lim Jae-Won
    Minerals & Materials Processing Division, Korea Institute of Geoscience & Mineral Resources
  • Kim Min-Seuk
    Minerals & Materials Processing Division, Korea Institute of Geoscience & Mineral Resources
  • Munirathnam N. R.
    Minerals & Materials Processing Division, Korea Institute of Geoscience & Mineral Resources
  • Le Minh-Tung
    Minerals & Materials Processing Division, Korea Institute of Geoscience & Mineral Resources Department of Materials Science Engineering, Chungnam National Univeristy
  • Uchikoshi Masahito
    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
  • Mimura Kouji
    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
  • Isshiki Minoru
    Institute of Multidisciplinary Research for Advanced Materials, Tohoku University
  • Kwon Hyuk-Chon
    Korea Institute of Industrial Technology
  • Choi Good-Sun
    Minerals & Materials Processing Division, Korea Institute of Geoscience & Mineral Resources

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タイトル別名
  • Effect of Ar/Ar-H<SUB>2</SUB> Plasma Arc Melting on Cu Purification

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Removal of impurities from Cu metal by Ar and Ar-20%H2 plasma arc melting (PAM) has been carried out. Several impurities such as Li, Na, Mg, P, S, Cl, K, Ca, Zn, Pd, Pb and Bi in Cu were efficiently removed when only Ar plasma gas was used. Moreover, removal degrees for the above mentioned impurities were significantly increased after Ar-20%H2-PAM, especially for K, Zn and Pd. It was found that Ar-H2 PAM showed an excellent effect to eliminate impurities with higher vapor pressures than that of Cu metal.

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