カルコパイライト系薄膜太陽電池の開発の現状と将来展望 Recent Developments in Chalcopyrite Solar Cell and Module Technologies

    • 石塚 尚吾 ISHIZUKA Shogo
    • 産業技術総合研究所太陽光発電研究センター化合物薄膜チーム Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology
    • 小牧 弘典 KOMAKI Hironori
    • 産業技術総合研究所太陽光発電研究センター化合物薄膜チーム Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology
    • 吉山 孝志 YOSHIYAMA Takashi
    • 産業技術総合研究所太陽光発電研究センター化合物薄膜チーム Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology
    • 水越 一路 MIZUKOSHI Kazuyuki
    • 産業技術総合研究所太陽光発電研究センター化合物薄膜チーム Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology

    • 山田 昭政 YAMADA Akimasa
    • 産業技術総合研究所太陽光発電研究センター化合物薄膜チーム Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology
    • 仁木 栄 NIKI Shigeru
    • 産業技術総合研究所太陽光発電研究センター化合物薄膜チーム Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology

抄録

  Chalcopyrite Cu(In, Ga)Se2(CIGS) and related compounds belong to the semiconducting I-III-VI2 materials family and are most promising thin film solar cells which have demonstrated up to 20% cell efficiencies and over 15% module efficiencies to date. Many CIGS companies in EU, US, and Japan have started several ten MW/year scale commercial production and have announced to increase their production capacities further within a couple of years. In this review, recent developments in highly efficient CIGS module technologies and issues to be solved for further development are discussed. Recent progress in the development of reliable alkali incorporation control techniques which is required to demonstrate high cell efficiencies from flexible CIGS cells fabricated on alkali-free substrates is also introduced. The mechanism behind the beneficial effects of alkali doping into CIGS absorber layers is also discussed.

収録刊行物

真空  

真空 53(1), 25-29, 2010-01-20 

日本真空協会

参考文献:  18件

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各種コード

  • NII論文ID(NAID) :
    10026292204
  • NII書誌ID(NCID) :
    AN00119871
  • 本文言語コード :
    JPN
  • 資料種別 :
    REV
  • ISSN :
    18822398
  • NDL 記事登録ID :
    10579734
  • NDL 雑誌分類 :
    ZN15(科学技術--機械工学・工業--流体機械)
  • NDL 請求記号 :
    Z16-474
  • 収録DB :
    CJP書誌  NDL  J-STAGE