タンデム型 ECR 多価イオン源-TAIKO Tandem ECR Multicharged Ion Source-TAIKO

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抄録

Multiply charged ions are important not only in ultrahigh energy physics but also in plasma processing technology. An ECR ion source in the minimum magnetic field was reconstructed with a plasma source attached in a tandem manner. It was achieved that the plasma source enables the ion source to be operated in lower gas pressure than before. This effect is important in maintaining the multicharged ions, since they are easily lost by charge transfer with neutral particles. The basic mechanism of generating the multicharged ions had been proposed to be stepwise ionization of atoms. Based on this principle charge state distributions of argon ions were computed and the results were compared with the experimental. A qualitative agreement was met.

収録刊行物

  • 富山県立大学紀要

    富山県立大学紀要 2, 61-68, 1992-03-30

    富山県立大学

各種コード

  • NII論文ID(NAID)
    110000477656
  • NII書誌ID(NCID)
    AN10358595
  • 本文言語コード
    JPN
  • ISSN
    09167633
  • データ提供元
    NII-ELS 
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