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(111) or (100)-oriented diamond films were successfully deposited on (111) or (100)-oriented surfaces of Au foil. The (111), (100) surfaces of Au substrates were prepared from commercially available Au foil, by repeated cold-rolling followed by plasma annealing at 900℃ in H_2. The microwave plasma chemical vapor deposition (CVD) method was employed for diamond deposition, using CH_4 diluted with H_2 as the carbon source. Au substrates were pretreated methods with supersonic scratching and bias enhanced methods before diamond growth. The diamond films were characterized by scanning electron microscopy (SEM), powder X-ray diffraction (XRD), X-ray micro analyzer (XMA) and Raman spectroscopy. By the results of these analysis, diamond films were found to be referentially oriented to the Au(111), (100) substrates with the (111) or (100) planes parallel to the Au substrate.