RF-マグネトロンスパッタ法によるBaTiO_3薄膜の結晶構造の変化 Changes in the Crystal Structure of RF-Magnetron Sputtered BaTiO_3 Thin Films

Abstract

The crystal structure of BaTiO_3 thin films fabricated by RF-magnetron sputtering has been investigated. As-sputtered films exhibited a cubic structure with a small grain size of about 6-8nm. After annealing at a temperature above 1100℃, the crystal structure changed from cubic to tetragonal, because the annealing process caused grain growth. The critical grain size of the thin films which provided the cubic structure existed in the range of 0.1-0.2 μm. This value agreed well with the critical grain size of BaTiO_3 fine particles, 0.12 μm.

Journal

Journal of the Ceramic Society of Japan   [List of Volumes]

Journal of the Ceramic Society of Japan 100(1165), 1091-1093, 1992-09-01  [Table of Contents]

The Ceramic Society of Japan

Cited by:  1

You must have a user ID to see the cited references.If you already have a user ID, please click "Login" to access the info.New users can click "Sign Up" to register for an user ID.

Preview

Preview

Codes

  • NII Article ID (NAID) :
    110002290080
  • NII NACSIS-CAT ID (NCID) :
    AN10040326
  • Text Lang :
    ENG
  • Article Type :
    Journal Article
  • ISSN :
    09145400
  • NDL Article ID :
    3784254
  • NDL Source Classification :
    無機化学・無機化学工業--セラミックス
  • NDL Source Classification :
    ZP9(科学技術--化学・化学工業--無機化学・無機化学工業--セラミックス・窯業)
  • NDL Call No. :
    Z17-249
  • DOI :
    10.2109/jcersj.100.1091
  • Databases :
    CJPref  NDL  NII-ELS  Journal@rchive