書誌事項
- タイトル別名
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- The Effect of Doped Aluminium on Thermal Stability of 4H- and 6H-SiC
- 4H- , 6H-SiC ノ アンテイセイ ニ オヨボス フジュンブツ アルミニウム ノ エイキョウ
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The effect of doped aluminium on thermal stability of basic structures was studied experimentally in the range from 2000°C to 2400°C. The results were summarized as follows;<br>(1) The 4H type SiC was stabilized by aluminium, and it could be changed 4H to 6H and 6H to 4H by exclusion and inclusion of the aluminium respectively.<br>(2) The distortion of the lattice was caused by the aluminium and the stability of 4H structure in this temperature range was attributed to this distortion.<br>(3) The 15R type seemed to be unstable in these conditions.
収録刊行物
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- 窯業協會誌
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窯業協會誌 78 (899), 224-228, 1970
公益社団法人 日本セラミックス協会
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詳細情報 詳細情報について
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- CRID
- 1390001205247811456
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- NII論文ID
- 110002305872
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- NII書誌ID
- AN00245650
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- ISSN
- 18842127
- 00090255
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- NDL書誌ID
- 8468332
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- 本文言語コード
- ja
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- データソース種別
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- JaLC
- NDL
- Crossref
- CiNii Articles
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- 抄録ライセンスフラグ
- 使用不可