A12-081 MANUFACTURING PROCESS OF FLAT DISPLAY :

• Ohmi,Tadahiro

  New Industry Creation Hatchery Center, Tohoku University

抄録

A large size display for entertainment, internet, PC and other information instruments is key tool for coming IT revolutionary era, so that the large size display must be characterized by very low electric power consumption and human friendly performance without tiring user's eyes. Thus, liquid crystal (LC) and electroluminescence (EL) displays are candidates for this target. High quality poly-silicon TFT is essentially required even for LCD displays instead current amorphous Si TFT, because very large current drivability is necessary for TFT due to the increase of LCD cell capacitor with an increase of display size up for 40 inches and 50 inches. The key issue for this target is a creation of very low temperature poly-Si TFT manufacturing technology without excimer laser annealing and very low cost manufacturing which is characterized by very simplified display structures and very simplified manufacturing steps based on very drastic progress of various relating materials and components such as backlights, polarizer, color filter, etc.

収録刊行物

• International Symposium on Micro-Mechanical Engineering : ISMME

  International Symposium on Micro-Mechanical Engineering : ISMME 2003 6-11, 2003-11-30

  日本機械学会

キーワード

• Radica Reaction
• Poly-Silicon
• TFT
• Flat Display

詳細情報

• CRID: 1542543045137277440
• NII論文ID: 110002344838
• NII書誌ID: AA11903244
• Web Site: http://dl.ndl.go.jp/info:ndljp/pid/10350966
• 本文言語コード: en
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