CoPt-SiO_2におけるCr-MO下地層の効果  [in Japanese] Effect of a Cr-Mo Underlayer on a CoPt-SiO_2 Thin Film  [in Japanese]

    • 領内 博 Ryonai H.
    • 松下電器産業(株)AVC商品開発研究所 AVC Products Development Lab., Matsyshita Electric In dustrial Co., Ltd.
    • 石田 達朗 Ishida T.
    • 松下電器産業(株)AVC商品開発研究所 AVC Products Development Lab., Matsyshita Electric In dustrial Co., Ltd.
    • 東間 清和 Tohma K.
    • 松下電器産業(株)AVC商品開発研究所 AVC Products Development Lab., Matsyshita Electric In dustrial Co., Ltd.

Abstract

Various ways of recording magnetic media for highdensity recording were investigated. The main characteristics required of a medium are low noise and high coercivity.We made a low-noise medium by simultaneous sputtering SiO_2 and CoPt onto a Cr underlayer at high Ar pressure and room temperature, and attempted to raise the coercivity of the medium. It has hitherto been recognized that a CoPt-SiO_2 medium is not influenced by a Cr underlayer. Howeber, we showed that the extent of the influence of the Cr underlayer changed according to the quantity of SiO_2. Our medium contained 10 at% of SiO_2. Recognizing that the effect of the Cr underlayer influenced the magnetic layer, we added Mo to the Cr underlayer, and were able to increase the coercivity by adjusting the crystal with CoPt and the Cr underlayer and by increasing the lattice spacing of the Cr. The medium noise was also reduced by adjustment in crystal with CoPt and Cr underlayer, and, as a result, the S/N ratio was improved at 150 kfci.

Journal

Journal of Magnetics Society of Japan   [List of Volumes]

Journal of Magnetics Society of Japan 23(4-2), 1017-1020, 1999-04-15  [Table of Contents]

The Magnetics Society of Japan (MSJ)

References:  5

You must have a user ID to see the references.If you already have a user ID, please click "Login" to access the info.New users can click "Sign Up" to register for an user ID.

Cited by:  2

You must have a user ID to see the cited references.If you already have a user ID, please click "Login" to access the info.New users can click "Sign Up" to register for an user ID.

Preview

Preview

Codes

  • NII Article ID (NAID) :
    110002810418
  • NII NACSIS-CAT ID (NCID) :
    AN0031390X
  • Text Lang :
    JPN
  • Article Type :
    Journal Article
  • ISSN :
    02850192
  • NDL Article ID :
    4694560
  • NDL Source Classification :
    ZM35(科学技術--物理学)
  • NDL Call No. :
    Z15-398
  • Databases :
    CJP  CJPref  NDL  NII-ELS