fct Fe-Ni-N薄膜の構造と飽和磁化  [in Japanese] Structure and Saturation Magnetization for fct Fe-Ni-N Films  [in Japanese]

    • 荘司 弘樹 Shoji H.
    • 東北大学大学院工学研究科電子工学専攻 Dept. of Electronic Engineering, Tohoku Univ.
    • 高橋 研 Takahashi M.
    • 東北大学大学院工学研究科電子工学専攻 Dept. of Electronic Engineering, Tohoku Univ.

Abstract

Fe-Ni-N films were fabricated on MgO{100}single-crystal substrates by dc facing-targets sputtering. Structural analysis and magnetic measurement were carried out. The results can be summarized as follows: (1) an Fe-Ni-N phase with fct structure and 11 at% N can be formed in a wide Ni content range from 20 to 40at%; (2) N atoms are located at the body center of the fct structure; (3) judging from the dependence of the saturation magnetization for fct Fe-Ni-N films with 11at% N on the Ni content, it is suggested that the fct phase does not strogly affect the appearance of giant magnetic moment in Fe-N films.

Journal

Journal of Magnetics Society of Japan   [List of Volumes]

Journal of Magnetics Society of Japan 23(4-2), 1193-1196, 1999-04-15  [Table of Contents]

The Magnetics Society of Japan (MSJ)

References:  8

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Codes

  • NII Article ID (NAID) :
    110002810462
  • NII NACSIS-CAT ID (NCID) :
    AN0031390X
  • Text Lang :
    JPN
  • Article Type :
    ART
  • ISSN :
    02850192
  • NDL Article ID :
    4695149
  • NDL Source Classification :
    ZM35(科学技術--物理学)
  • NDL Call No. :
    Z15-398
  • Databases :
    CJP  NDL  NII-ELS