Sensitive Strain Gauge Using a CMOS IC Combined with an Amorphous Magnetostrictive Wire Cantilever Beam
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- Shen L. P.
- Dept. of Electrical Eng., Nagoya Univ.
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- Kita E.
- Dept. of Electrical Eng., Nagoya Univ.
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- Naruse Y.
- Dept. of Electrical Eng., Nagoya Univ.
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- Mohri K.
- Dept. of Electrical Eng., Nagoya Univ.
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- Uchiyama T.
- Dept. of Electrical Eng., Nagoya Univ.
Bibliographic Information
- Other Title
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- アモルファス磁歪ワイヤ片持ちバリとCMOS ICによる高感度ひずみゲージ
- アモルファス ジワイ ワイヤ カタモチ バリ ト CMOS IC ニヨル コウ
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Abstract
A highly sensitive linear strain gauge using a pair of amorphous CoSiB wires fixed to a plastic cantilever beam combined with a CMOS IC multivibrator circuit is presented. The wires are magnetized with a sharp pulse current to generate the stress impedance (SI) effect, showing a gauge factor of about 2000 in the CMOS IC circuit The linear strain gauge shows a resolution of about 2.5 mg for weight detection with high linearity in the range of −0.75∼1.25 g. The mechanism of the SI characteristics in the CoSiB wire is analyzed using a magnetization rotation model. Pulsation of fingertip blood vessels was stably detected by using the SI gauge stress sensor.
Journal
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- Journal of the Magnetics Society of Japan
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Journal of the Magnetics Society of Japan 22 (4_2), 677-680, 1998
The Magnetics Society of Japan
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Keywords
Details 詳細情報について
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- CRID
- 1390001205093788160
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- NII Article ID
- 110002811512
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- NII Book ID
- AN0031390X
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- ISSN
- 18804004
- 02850192
- http://id.crossref.org/issn/02850192
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- NDL BIB ID
- 4458122
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- Data Source
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- JaLC
- NDL
- Crossref
- NDL-Digital
- CiNii Articles
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- Abstract License Flag
- Disallowed